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... reactions due to vacuum annealing for a-Si/ HfSiO(N)/ Si gate stack studied by synchrotron radiation photoemission spectroscopy Hiroyuki KAMADA 1, Tatsuhiko TANIMURA 1, Satoshi TOYODA 1 ...
... Sample stage Analyzer Ion Pump MCP 16A/2008U004 Development of a three-dimensional scanning photoelectron microscope (3D-nano ESCA) Yuki NAKAMURA 1, Yasushi TOYOSHIMA 1, Satoshi TOYODA 1-3 ...
... ULVAC, Inc. ＊＊ Semiconductor Equipment Division 1, ULVAC, Inc. Development of Low-resistivity TiN Films using Cat Radical Sources Masamichi Harada*, Yohei Ogawa*, Satoshi Toyoda ...
Finally, Satoshi Toyoda of the Spare Parts Department and the Field Service Group’s Nobuo Fukui described plans and policies. Lunch was followed by informative presentations by ...
Takashi Ando, Takayoshi Shimura, Heiji Watanabe, Tomoyuki Hirano 1, Shinichi Yoshida 1, Kaori Tai 1, Shinpei Yamaguchi 1, Hayato Iwamoto 1, Shingo Kadomura 1, Satoshi Toyoda 2, ...
... due to vacuum annealing for a-Si/ HfSiO(N)/ Si gate stack studied by synchrotron radiation photoemission spectroscopy Hiroyuki KAMADA 1, Tatsuhiko TANIMURA 1, Satoshi TOYODA 1 ...
... Ion Pump MCP 16A/2008U004 Development of a three-dimensional scanning photoelectron microscope (3D-nano ESCA) Yuki NAKAMURA 1, Yasushi TOYOSHIMA 1, Satoshi TOYODA 1-3, Koji ...
... Semiconductor Equipment Division 1, ULVAC, Inc. Development of Low-resistivity TiN Films using Cat Radical Sources Masamichi Harada*, Yohei Ogawa*, Satoshi Toyoda* and ...
Linkedin
JoeNets. Inc. (Human Resources industry): Representative Director, (April 1997-Present)
TOIN CORPORATION (Privately Held; Translation and Localization industry): Localization Project Manager, (June 2007-May 2010)