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Design and Development of Novel Monomers and Copolymers for 193-nm Lithography: 475-482: Atsushi Otaka, Emi Araya, Hikaru Momose, Ryuichi Ansai, Masayuki Tooyama and Tadayuki ...
Design and Development of Novel Monomers and Copolymers for 193-nm Lithography: 475-482: Atsushi Otaka, Emi Araya, Hikaru Momose, Ryuichi Ansai, Masayuki Tooyama and ...
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