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Keeyoung Jun, Yasuyuki Egashira 1 and Yukihiro Shimogaki. Department of Materials Engineering, School of Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656 ...
Effect of Partial Pressure of TiCl 4 and NH 3 on Chemical Vapor Deposition Titanium Nitride (CVD-TiN) Film Cl Content and Electrical Resistivity: Keeyoung Jun and Yukihiro Shimogaki
Keeyoung Jun and Yukihiro Shimogaki Published March 26, 2004 (full text PDF : MD5 checksum = 7b4b0ff2de875cf8898f5e2833b81b70) L563-L565 : Solvent Vapor Posttreatment of Polymer ...
Improvement of TiN Flow Modulation Chemical Vapor Deposition from TiCl 4 and NH 3 by Introducing Ar Purge Time: Keeyoung Jun, Ik-Tae Im and Yukihiro Shimogaki
Keeyoung Jun, Yasuyuki Egashira 1 and Yukihiro Shimogaki. Department of Materials Engineering, School of Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo ...
Effect of Partial Pressure of TiCl 4 and NH 3 on Chemical Vapor Deposition Titanium Nitride (CVD-TiN) Film Cl Content and Electrical Resistivity: Keeyoung Jun and Yukihiro ...
Keeyoung Jun and Yukihiro Shimogaki Published March 26, 2004 (full text PDF : MD5 checksum = 7b4b0ff2de875cf8898f5e2833b81b70) L563-L565 : Solvent Vapor Posttreatment of ...
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Samsung Electronics (Public Company; Electrical/Electronic Manufacturing industry): Process engineer, (October 2005-September 2008)
Mitsubishi Heavy Industries&nb...