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Isamu Makihira , Tomio Nagatsuka , Kazuaki Niwa , Hidetoshi Miyamoto: New high sensitive ... transferred down to underlying spin-on carbon hard mask (HM) using N2/O2 RIE.
yasutoshi shimizu, rie suzuki, yoshitaka ebie, yuhei inamori and ryuichi sudo ... fujita, michihiko ike, tomonori ishigaki, kazunari sei, jin-suk jeong, naohisa makihira ...
It was found that oxygen reactive ion etching (RIE) of the printed carbon black is ... T. Asano, E. Shibata, D. Sasaguri, K. Makihira and K. Higa: Jpn. J. Appl. Phys. 36 (1997 ...
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