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S elf-ali gned-sili cide (SALICIDE) technology had been widely used to improve the RC ... Tang Leijun
Tang Leijun: Pey Kin Leong. Mr Tung Chih Hang. 16 May 2005: Physical analysis on ultrathin gate dielectric breakdown using TEM: Wang Minrui: Rusli: 16 May 2005
Tang Leijun, "Physical Analysis Ultrathin Gate Dielectric BD Using TEM", MEng Thesis, School of EEE, Nanyang Technological University, 2005.
S elf-ali gned-sili cide (SALICIDE) technology had been widely used to improve the ... Tang Leijun
Tang Leijun: Pey Kin Leong. Mr Tung Chih Hang. 16 May 2005: Physical analysis on ultrathin gate dielectric breakdown using TEM: Wang Minrui: Rusli: 16 May 2005
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