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... HfO2 Gate Dielectrics for future ULSI CMOS Devices (invited) M.F.Li, H.Y.Yu, Y.T.Hou ... Plasma for Ultra-thin Gate Dielectrics of 65 nm Technology Node and Beyond Hanming Wu ...
Chen Wanzhu, Rui Hanming, Zhang Ling (College of Light Industry and Food Science, South ... HOU Hui-rong (Jiangsu Food Science College,Huaian 223003,China); Study on ...
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