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... by Deposited Fluorocarbon Film during SiO2 Etching.[International Symposium on Dry Prosess,(2003),265-270] Yuya Suzuki, Tadashi Shimmura, Mitsumasa Koyanagi,Kazuhiro Hane ...
Takahiko Shimmura, Yoshinao Shiraki, Naoki Mukawa, Minako Sawaki and Norihiro Hagita ... Mayumi Yuasa, Osamu Yamaguchi and Kazuhiro Fukui, Japan : Adaptive Background ...
Takahiro Shimmura, Yoshinao Shiraki, Naoki Mukawa, Minako Sawai and Norichiro ... Yutaka Satoh, Hideki Tanahashi, Shunichi Kaneko, Yoshinori Niwa and Kazuhiro ...
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