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Ootsu Masaya Komatsu Shunsuke Katou Akira Tsukiji Hiroshi Takahashi Ichirou Watanabe Takamitsu Tsugawa Yutaka Harada Kazuo Kanbayashi Jun Morimoto Senta
Masato Shibuya, Masaya Komatsu, Toshihiko Ozawa and Hiroshi Ooki X-Ray Lithography 6878-6887 : High-Accuracy Defect-Free X-Ray Mask Technology
A Novel Super-Resolution Technique for Optical Lithography--Nonlinear Multiple Exposure Method: Hiroshi Ooki, Masaya Komatsu and Masato Shibuya
Performance of Resolution Enhancement Technique Using Both Multiple Exposure and Nonlinear Resist: Masato Shibuya, Masaya Komatsu, Toshihiko Ozawa and Hiroshi Ooki
# SEIYUU DATABASE as of 2011╟» 1╖ε 16╞ⁿ ╞ⁿ═╦╞ⁿ 19:42:10 JST # seiyuu event database # maintained by Hitoshi Doi <doi@usagi.org>
Masato Shibuya, Masaya Komatsu, Toshihiko Ozawa and Hiroshi Ooki X-Ray Lithography 6878-6887 : High-Accuracy Defect-Free X-Ray Mask Technology
A Novel Super-Resolution Technique for Optical Lithography--Nonlinear Multiple Exposure Method: Hiroshi Ooki, Masaya Komatsu and Masato Shibuya
Performance of Resolution Enhancement Technique Using Both Multiple Exposure and Nonlinear Resist: Masato Shibuya, Masaya Komatsu, Toshihiko Ozawa and Hiroshi Ooki
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ASML Japan (Public Company; Semiconductors industry): Field Applications, Group Leader, (June 2002-Present)
LSI Logic Japan Semiconductor, Inc. (Semiconductors industry): Litho pro...