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Masayuki Hida *, Tsubasa Shimoda, Naoya Hayashi, Mizuo Omori, and Toru Nakagawa (Osaka Gakuin University) Presented at The Second TRIZ Symposium in Japan
Photomaskissues for 45-32nm Photomaskissues for 45-32nm 20 20 th th June, 2005 June, 2005 Naoya Hayashi Naoya Hayashi Electronic Device Laboratory Electronic Device Laboratory Dai Nippon ...
... Denki Univ. (Japan) Organizing Committee Vice-Chair: Masato Shibuya, Tokyo Polytechnic Univ. (Japan) Organizing Committee: Parkson W. Chen, Taiwan Mask Corp. (Taiwan); Naoya Hayashi ...
... vsEUV Lithography Panel Moderators: Giang Dao(Intel/ISMT) Shinji Okazaki(Hitachi/ASET) Panelists: Luc van den Hove(IMEC) Mike Lercel(IBM/ISMT) Naomichi Abe(Fujitsu/EUVA) Naoya Hayashi(DNP) ...
Linda Sun : Naoya Hayashi : Kentaro Kawamoto : Internship (Overseas) & Social Entrepreneurship Practice Staff (Associate Professor ...
Masayuki Hida *, Tsubasa Shimoda, Naoya Hayashi, Mizuo Omori, and Toru Nakagawa (Osaka Gakuin University) Presented at The Second TRIZ Symposium in Japan
Photomaskissues for 45-32nm Photomaskissues for 45-32nm 20 20 th th June, 2005 June, 2005 Naoya Hayashi Naoya Hayashi Electronic Device Laboratory Electronic Device Laboratory Dai ...
... with SEMATECH and its leading-edge industry partners on critical mask cleaning technology for next generation lithography processes," said Mr. Naoya Hayashi, research ...
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Dai Nippon Printing Co., Ltd. (Electrical/Electronic Manufacturing industry): General Manager of Electronic Device Laboratory, (April 2002-June 2007)