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Tokyo research center TOSOH CorporationTaishi Furukawa Noriaki Oshima Department of Innovative and Engineered Materials Tokyo Institute of Technology Hiroshi Funakubo
11) "The Effect of Precursor Ligands on the Deposition Characteristics of Ru Films by MOCVD", Kazuhisa Kawano, Hiroaki Kosuge, Noriaki Oshima, and Hiroshi Funakubo, Electrochem.
Kazuhisa Kawano, Atsushi Nagai, Hiroaki Kosuge, Tetsuo Shibutami, Noriaki Oshima and Hiroshi Funakubo, “Seed Layer Free Conformal Ruthenium Film Deposition on Hole Substrates by ...
NOVEL RUTHENIUM(II) OLEFIN COMPLEX WITH A COORDINATED ALICYCLIC CARBON–HYDROGEN BOND : Kenji Itoh and Noriaki Oshima [Full Text PDF]
Hironori Fujisawa, Soichi Watari, Naoya Iwamoto, Masaru Shimizu, Taishi Furukawa 1,2, Kazuhisa Kawano 1,2 and Noriaki Oshima 1,2. Department of Electrical Engineering and Computer ...
Tokyo research center TOSOH CorporationTaishi Furukawa Noriaki Oshima Department of Innovative and Engineered Materials Tokyo Institute of Technology Hiroshi Funakubo
11) "The Effect of Precursor Ligands on the Deposition Characteristics of Ru Films by MOCVD", Kazuhisa Kawano, Hiroaki Kosuge, Noriaki Oshima, and Hiroshi Funakubo ...
NOVEL RUTHENIUM(II) OLEFIN COMPLEX WITH A COORDINATED ALICYCLIC CARBONHYDROGEN BOND : Kenji Itoh and Noriaki Oshima [Full Text PDF]
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