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Evaluation of Post Dry-etching Roughness in ArF Resists by Spectroscopic Ellipsometry Analysis: 517-522: Ryoko Yamanaka, Yasushi Gotoh and Toshihiko Tanaka
Atsushi Saiki, Ryoji Oshio, Michio Suzuki, Akio Tanaka, Toshihiko Itoga 1 and Ryoko Yamanaka 1. Hitachi Plant Engineering & Construction Co., Ltd., Chiyoda-ku, Tokyo 101 1 Central ...
Yuko Tsuchiya, Takashi Hattori, Ryoko Yamanaka and Hiroshi Shiraishi. Chemically Amplified Silicon Containing Resist for ArF Excimer Laser Lithography.
Hiroshi Fukuda and Ryoko Yamanaka 4131-4136 : Photolithography System Using a Combination of Modified Illumination and Phase Shift Mask Kazuya Kamon, Teruo Miyamoto, Yasuhito Myoi ...
... some fresh work in space 2A!, a seven artist exhibition from students of Tokyo Polytechnic University, Yasuyo Kaneta, Satoko Narahara, Saori Kumesawa, Tomomi Yoshie, Ryoko Yamanaka ...
Evaluation of Post Dry-etching Roughness in ArF Resists by Spectroscopic Ellipsometry Analysis: 517-522: Ryoko Yamanaka, Yasushi Gotoh and Toshihiko Tanaka
Atsushi Saiki, Ryoji Oshio, Michio Suzuki, Akio Tanaka, Toshihiko Itoga 1 and Ryoko Yamanaka 1. Hitachi Plant Engineering & Construction Co., Ltd., Chiyoda-ku, Tokyo 101 ...
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Bank of Tokyo-Mitsubishi UFJ (Canada) (Banking industry): Assistant/ Analyst, (December 2006-June 2010)