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Katsuhiro Aoki, Ikuko Murayama 1, Yukio Fukuda and Akitoshi Nishimura 1. Texas Instruments Tsukuba Research & Development Center, Limited, 17 Miyukigaoka, Tsukuba-shi, Ibaraki ...
Yukio Fukuda, Katsuhiro Aoki, Ken Numata, Akitoshi Nishimura ULSI Technology Center, Texas Instruments Japan Ltd., 2350 Kihara, Miho-mura, Inashiki-gun, Ibaraki 300-04, Japan
Temperature Dependence of TaSiN Thin Film Resistivity from Room Temperature to 900°C: Munenori Oizumi, Katsuhiro Aoki and Yukio Fukuda: Release Date: 20030328
Katsuhiro Aoki: Office and classrooms: Narukozaka Heights 2F, 6-26-11, Nishi Shinjuku, Shinjuku, Tokyo, 160-0023 Access [Public Transport] 15 minutes walk from JR Shinjuku Station.
Yukio Fukuda, Ken Numata, Katsuhiro Aoki, Akitoshi Nishimura, Gaku Fujihashi, Soichiro Okamura, Shizutoshi Ando and Takeyo Tsukamoto: Release Date: 19991001
Katsuhiro Aoki, Ikuko Murayama 1, Yukio Fukuda and Akitoshi Nishimura 1. Texas Instruments Tsukuba Research & Development Center, Limited, 17 Miyukigaoka, Tsukuba-shi ...
Tomoyuki Sakoda, Katsuhiro Aoki and Yukio Fukuda. Advanced Materials & Characterization,Texas Instruments Tsukuba Research & Development Center Ltd., 17 Miyukigaoka ...
Katsuhiro Aoki, Yukio Fukuda and Akitoshi Nishimura ULSI Technology Development, Texas Instruments Japan Limited, 2350 Kihara, Miho-mura, Inashiki-gun, Ibaraki 300-04
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