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Akihiro Itai, Takahiro Kotaki, Kenji Tanabe, Mari Fukuda, Yuko Kawata, Yuri Amano and Naoko Fujita: Release Date: February 24, 2006 [Image PDF (789K)]
1-4 : Epitaxial Silicon Growth by Load-Lock Low Pressure Chemical Vapor Deposition System for Elevated Source/Drain Formation Masayuki Nakano, Hiroshi Kotaki, Kenji ...
1-4: Epitaxial Silicon Growth by Load-Lock Low Pressure Chemical Vapor Deposition System for Elevated Source/Drain Formation: Masayuki Nakano, Hiroshi Kotaki, Kenji Ohta and ...
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