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Robust MaskDesign with Defocus Variation Using Inverse Synthesis Ningning Ji a a,AlfredK.Wong b, and Edmund Y. Lam a a Imaging Systems Laboratory, Department of Electrical and ...
Ningning Jia, Alfred K. Wong, and Edmund Y. Lam, Robust photomask design with defocus variation using inverse synthesis, in Lithography Asia, volume 7140 of ...
Ningning Jia, Alfred K. Wong, and Edmund Y. Lam, Regularization of inverse photomask synthesis to enhance manufacturability, in Lithography Asia, volume 7520 ...
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