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Analysis of O(1D) Distribution by Time-Resolved Measurement of Ozone Density for Application of UV-light Excited Ozone to Oxidation Process Aki TOSAKA, Tetsuya NISHIGUCHI ...
Low-Temperature Oxidation of Silicon using UV-Light-Excited Ozone. Aki Tosaka 1, Tetsuya Nishiguchi 1,2, Hidehiko Nonaka 1 and Shingo Ichimura 1. 1 National Institute of ...
Analysis of O(1 D) Distribution by Time-Resolved Measurement of Ozone Density for Application of UV-light Excited Ozone to Oxidation Process: 123-125: Aki TOSAKA, Tetsuya ...
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