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1 Etch Rate and Surface Morphology of Polycrystalline β-Silicon Carbide Using Chlorine Trifluoride Gas Hitoshi Habuka, Satoko Oda, Yasushi Fukai 1, Katsuya Fukae 2, Takashi Takeuchi ...
Yutaka Miura, Hitoshi Habuka, Yusuke Katsumi, Satoko Oda, Yasushi Fukai 1, Katsuya Fukae 1, Tomohisa Kato 2, Hajime Okumura 2, and Kazuo Arai 2
Hitoshi Habuka, Satoko Oda, Yasushi Fukai, Katsuya Fukae, Takashi Takeuchi and Masahiko Aihara Published March 8, 2005 [Full Text PDF (205K)] [Buy This Article]
Hitoshi Habuka, Satoko Oda, Yasushi Fukai, Katsuya Fukae, Takashi Takeuchi and Masahiko Aihara: Release Date: 20071228 ...
1 Etch Rate and Surface Morphology of Polycrystalline -Silicon Carbide Using Chlorine Trifluoride Gas Hitoshi Habuka, Satoko Oda, Yasushi Fukai 1, Katsuya Fukae 2, Takashi ...
Yutaka Miura, Hitoshi Habuka, Yusuke Katsumi, Satoko Oda, Yasushi Fukai 1, Katsuya Fukae 1, Tomohisa Kato 2, Hajime Okumura 2, and Kazuo Arai 2
Hitoshi Habuka, Satoko Oda, Yasushi Fukai, Katsuya Fukae, Takashi Takeuchi and Masahiko Aihara Published March 8, 2005 [Full Text PDF (205K)] [Buy This Article]
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