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Masaki Hirayama, Wataru Shindo and Tadahiro Ohmi 2276-2278 : Interfacial Defects Related to the Substrate Treatment in Molecular Beam Epitaxial Silicon
Impact of High-Precision RF-Plasma Control on Very-Low-Temperature Silicon Epitaxy: Masaki Hirayama, Wataru Shindo and Tadahiro Ohmi: Release Date: 19991001
Hajime Kumami, Wataru Shindo, Kazuhide Ino and Tadahiro Ohmi 3272-3277 : In Situ Infrared Spectroscopy on the Wet Chemical Oxidation of Hydrogen-Terminated Si Surfaces
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