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Mitsuyoshi Endo, Akihiro Kojima, Yoshiaki Shimooka, Yoshiaki Sugizaki, Hiroaki Yamazaki, Etsuji Ogawa, Tamio Ikehashi, Tatsuya Ohguro, Susumu Obata, Yusaku Asano, Takeshi Miyagi ...
Yoshiaki Shimooka, Tadashi Iijima, Shinichi Nakamura 1 and Kyoichi Suguro Microelectronics Engineering Lab., Toshiba Corporation, 1, Komukai Toshiba-cho, Saiwai-ku, Kawasaki ...
Yoshiaki Shimooka, Tadashi Iijima, Shinichi Nakamura and Kyoichi Suguro 1593-1596 : Effect of SiO 2 Film Deposition on the Ferroelectric Properties of a Pt/Pb(Zr, Ti)O 3 /Pt ...
Gaku Minamihaba, Tadashi Iijima, Yoshiaki Shimooka, Hitoshi Tamura, Takashi Kawanoue, Hideaki Hirabayashi, Naoaki Sakurai, Hideki Ohkawa, Takashi Obara, Hidemitu Egawa, Toshiaki ...
Correlation of W-Si-N Film Microstructure with Barrier Performance against Cu Diffusion: Yoshiaki Shimooka, Tadashi Iijima, Shinichi Nakamura and Kyoichi Suguro
Mitsuyoshi Endo, Akihiro Kojima, Yoshiaki Shimooka, Yoshiaki Sugizaki, Hiroaki Yamazaki, Etsuji Ogawa, Tamio Ikehashi, Tatsuya Ohguro, Susumu Obata, Yusaku Asano, Takeshi ...
Yoshiaki Shimooka, Tadashi Iijima, Shinichi Nakamura 1 and Kyoichi Suguro Microelectronics Engineering Lab., Toshiba Corporation, 1, Komukai Toshiba-cho, Saiwai-ku ...
Yoshiaki Shimooka, Tadashi Iijima, Shinichi Nakamura and Kyoichi Suguro 1593-1596 : Effect of SiO 2 Film Deposition on the Ferroelectric Properties of a Pt/Pb(Zr, Ti ...
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TOSHIBA (Semiconductors industry): Device Engineer, (April 1996-September 2002)
TOSHIBA (Semiconductors indus...